System-Technology Co-Evaluation of A7 CFET and A10 NSFET Technologies from Cell Parasitics to Chip Reliability

RESUMO

Complementary FETs (CFETs) extend nanosheet FET (NSFET) scaling by vertically stacking n- and p-type gate-all-around (GAA) devices, thereby shrinking standard-cell area. The performance gain, however, cannot be assessed from device metrics alone, as CFET layouts also introduce larger cell-level parasitic resistance and capacitance (RC). In this work, we present a physics-based thermal- and aging-aware system-technology co-evaluation (STCO) flow to assess parasitic RCs in A7 CFET and A10 NSFET technology nodes. Our flow links calibrated device models, optimized standard-cell generation, automated GDS-to-TCAD conversion enabling accurate 3D parasitic RC extraction, full RTL-to-GDS implementation for an AI accelerator, multiphysics thermal analysis, and physics-based bias temperature instability (BTI) aging evaluation. Using the same device model for both technologies, we can isolate the impact of parasitic RCs and design at different levels of the design flow. The results of the AI accelerator design demonstrate that the A7 CFET reduces the chip area by 24.7% and the total wire length by 12%, improving the area efficiency TOPS/mm^2 by 74% relative to the baseline of the A10 NSFET. Under iso-frequency operation, results reveal that CFET voltage scaling reduces power by 68% and lowers power density from 148 W/cm^2 to 55 W/cm^2, which reduces the chip's temperature from 125 degrees C down to merely 62 degrees C. The resulting reduction in stress temperature suppresses 10-year BTI-induced degradation by 39%, reducing the required aging timing guardband by 53%.